Company History

• Company Objective:
  Development of high precision, leading edge CD (linewidth) Metrology & Inspection Tools
• Founders:
  Experts in Optics, Software Development and Mechanical Engineering

First customized Tool for CD and Film-Thickness Measurements shipped. MueTec-Software already simulates Windows.

Remarkable success in German market

Cooperation agreement for sales and service signed with Leica Microsystems    

High volume purchase order received from the world's largest semiconductor manufacturer
Introduction of a new Mask CD Metrology System: 
the Leica LWM Tool (developed and manufactured by MueTec) becomes the worldwide industry standard within a year

Introduction of I-line@365nm Illumination

Opening a new R&D center and production site with clean roomclass100 capability in Aholming, Germany

Introduction of DUV (248nm) illumination that became the standard in mask metrology 2001

Release of the next generation mask metrology tool

Introduction of a Water Immersion (WI) mask metrology tool for reticles for the 65nm technology node

First Shipment of the 65nm technology node mask CD tool

Introduction of the first Defect Inspection Tool using MueTec's SDI (Smart Defect Inspection) technology. 
Shipment of the first tool in Europe

Join Development of an Infrared (IR) Detect Inspection Tool with Vistec Semiconductor (today KLA-Tencor IRIS2000).
First installations in Japan.

First shipment of the IR Defect Inspection Tool to leading MEMS manufacturer in the US

Incorporation of MueTec Taiwan Ltd.

MueTec announces the 250th tool installed worldwide

Introduction of „Spector-A“, a fully automated mask inspection tool

Investor and management buy-out for continued company growth

Market launch of a new line of macro defect inspection tools for recipe-less operation at 200 wafer per hour

Introduction of Argos 300, a high-throuput, recipe-less 300mm macro defect inspection product

Launch of the Rembrandt series, a high-resolution, recipe-less 300mm macro defect inspection tool