Leading products in optical metrology Made in Germany

Mask Inspection

High Throuput Macro Defect Inspection

MueTec’s mask inspection is using a die-to-die approach to detect statistical failures on the mask. This tool is used to monitor the masks in wafer manufacturing, typically in power semiconductor, LED and MEMS manufacturing. 

Our tool helps the customer to automatically decide if the photomask is good, requires cleaning or needs to be replaced. 

 

 

 

Products

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Spector
Automatic and fully enclosed with FFU

Typical Application

Mask defect inspection


Key Features

Fully enclosed tool architecture

Robot handling of masks with up to 2 pod or cassette stations

Automatic inspection based on die-to-die comparison

Resolution of 0,5 μ/pixel

Defect sizes as of 1 μm

Mask sizes up to 14’’

muetec-Spector-A.jpg

Spector A
Automatic with mask robot and mask carriers

Typical Application

Mask defect inspection


Features

Open tool architecture

Robotor mask loading and unloading

Fully automatic mask inspection

Automatic inspection based on die-to-die comparison

Resolution as of 0,5 μ/pixel

Defect sizes as of 1 μm

Mask sizes up to 14’’

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Spector M
Semi Automatic

Typical Application

Mask defect inspection


Features

Open tool architecture

Manual operator mask loading and unloading

Automatic inspection based on die-to-die comparison

Resolution as of 0,5 μ/pixel

Defect sizes as of 1 μm

Mask sizes up to 14’’

Contact

MueTec Europe

Headquarter

+49 89 1500 169 0

info@muetec.com

Hans-Bunte-Str. 5
80992 Munich / Germany

 

 

Manufacturing

+49 9938 9191-0

info@muetec.com

Isarauer Str. 77
94527 Aholming / Germany