MueTec provides highest precision and repeatability for production qualification of photomasks, including but not limited to COG (chrome on glass) and PSM (phase shift masks). Measurements include the distribution of CD uniformity on the mask. We offer visible light and UV light illumination in both reflective and transmitted mode. UV illumination is used to measure feature sizes down to 300 nm. 3-sigma repeatability is typically in the nanometer range.
For incoming mask inspection, we also provide long-distance objective lenses for measurements through pellicle.
Mask CD MetrologyShow details
Critical Dimension Metrology
Cost effective solution for mask layers with feature sizes of 300nm and above
UV and visable light capability
Reflected and transmitted light
Highest quality opticcs
Flexible tool configurations available
CD repeatability (3 sigma) long term < 4 nm (etched layer)