MueTec provides in addition to the worldwide well established optical CD (Critical Dimension) mask metrology a cost effective and fast mask defect inspection method to capture statistical defects. Our systems are used in wafer manufacturing, photomask manufacturing, MEMS and LED manufacturing and in research institutes.
- Cost effective solution for statistical defecs
- VIS capability
- Reflected and transmitted light
- High quality objectives
- Flexible tool configurations available (manual to fully automized mask handling)
- Bare mask and pellicle inspection
- Universal use, in addition to inspection also CD-metrology