DaVinci 300 iOVL
DaVinci technology
The DaVinci system for metrology is used for high precision overlay and critical dimensions (CD) measurement tasks. We enable our customers to monitor the single manufacturing steps and derive necessary process adaptions. The combination of highest precision, throughput, best repeatability and user-friendly operation are key element of this system. A closed frame design and fully automated operation are basic requirements for usage in high end semiconductor foundries.
Used in:
Semiconductor manufacturing - Front-END
Key differences:
Closed frame tool; tool for 300mm wafer
Key Features:
Metrology (overlay, critical dimension) - optimized for overlay measurement; 90nm node
Product highlights
- fully automated metrology system
- closed tool architecture
- robot-based and manual wafer loading possible
- typical application: metrology from wafer in 90nm logic technology node and above
- overlay and critical dimension (CD) measurement
- SECS/GEM interface - fully remote host control
- combined reflected & transmitted light illumination modes
- 300mm wafer
- dual arm robot handling with wafer mapper
Your contacts
Arne Holland
Head of Sales, Service and Applications
