DaVinci 150 / 200
DaVinci technology
The DaVinci system for metrology is used for high precision overlay and critical dimensions (CD) measurement tasks. We enable our customers to monitor the single manufacturing steps and derive necessary process adaptions. The combination of highest precision, throughput, best repeatability and user-friendly operation are key element of this system. A closed frame design and fully automated operation are basic requirements for usage in high end semiconductor foundries.
Used in:
Semiconductor manufacturing - Front-END
Key differences:
Closed frame tool; Tool for 150mm or 200mm Wafer
Key Features:
Metrology (overlay, critical dimension); film thickness measurement
Product highlights
- fully automated metrology system
- closed tool architecture
- robot-based and manual wafer loading possible
- configuration with SMIF loadport or open cassette (OC) adapter possible
- typical application: wafer metrology
- overlay and critical dimension (CD) measurement
- SECS/GEM interface - fully remote host control
- combined reflected & transmitted light illumination modes
- 150mm / 200mm wafer
- dual arm robot handling with wafer mapper
Your contacts
Arne Holland
Head of Sales, Service and Applications
