SPECTOR-A
SPECTOR technology
The SPECTOR system for Mask defect inspection will be applicable for mask manufacturer and quality department from semiconductor manufacturer to analyse and evaluate the condition from masks and reticles. A full automatic measurement and analysation proposed the user to decide if the photomask is good, requires cleaning or needs to be replaced. Integrated in a fully automated closed frame tool or as an open frame tool for semi-automated operation are these platforms attractive for different market segments.
Used in:
Semiconductor manufacturing - Front-END
Key differences:
Open frame tool; fully-automated for mask sizes up to 9"
Key Features:
Defect inspection from masks; recipeless operation
Product highlights
- semi-automatic
- typical application: mask defect inspection
- open tool architecture
- robot based mask loading and unloading
- automatic inspection based on die-to-die comparison
- mask thickness 90 - 250 mil
- detectable defect sizes > 0,8 μm
- mask sizes up to 9 inch
Your contacts
Arne Holland
Head of Sales, Service and Applications
