SPECTOR 5500
SPECTOR - Technology
The SPECTOR system for Mask defect inspection will be applicable for mask manufacturer and quality department from semiconductor manufacturer to analyse and evaluate the condition from masks and reticles. A full automatic measurement and analyzation proposed the user to decide if the photomask is good, requires cleaning or needs to be replaced. Integrated in a fully automated closed frame tool or as an open frame tool for semi-automated operation are these platforms attractive for different market segments.
Used in:
semiconductor manufacturing - Front-END
Key differences:
Closed Frame Tool; Mask Defect inspection
Key Features:
Mikro defekt inspection on Masks
Product Highlights
- Fully automated inspection system
- Closed tool architecture
- Robot based and manual mask loading possible
- Typical application: Mask defect inspection
- Automatic inspection based on golden image or die-to-die comparison
- SECS/GEM interface - Fully remote host control
- Mask sizes up to 14 inch
- Dual arm robot handling with mapper
- Flipper Module
- Infrared metrology
Your Contacts
Arne Holland
Head of Sales, Service and Applications
