Rembrandt 200 / 300

Rembrandt 200 / 300

Rembrandt - Technology

The Rembrandt system for macro imaging is developed for high resolution wafer analysis. A high-resolution camera, precision linear stages and machine vision optics are the basis for generating pictures with pixel size down to 1µm resolution. The meassurement principle is moving a Wafer via x-/y-stage and take images of the whole Wafer by stiching all shots together. Application of this technology can be found in development departments from semiconductor manufacturer. Through our interactive software, the review from the complete wafer scan is intuitive and enables the user for dynamically analyse of structures on substrate by a manual process.

Used in: 
semiconductor manufacturing - Front-END and Back-End

Key differences: 
Closed Frame Tool; TOOL FOR Wafer Imaging

Key Features: 
Wafer Micro Imaging 

Product Highlights

  • Fully automated imaging system
  • Closed tool architecture
  • Robot based and manual wafer loading possible
  • Typical application: High resolution macro imaging of wafer 
  • Image resolution from 1µm
  • SECS/GEM interface - Fully remote host control
  • Bright and dark field illumination
  • High resolution machine vision optics
  • 200mm / 300mm Wafer
  • Dual arm robot handling with wafer mapper

Your Contacts

Arne Holland
Head of Sales, Service and Applications