DaVinci 270UV

DaVinci 270UV

DaVinci 270UV - Technology

The DaVinci 270UV system for Mask Metrology is a customer-specific development based on our established open frame mask tool MT270UV. Through the integration in an enclosed system with robot handling we developed a new Tool for fully automated operation. It measures Critical Dimensions (CD) from feature size of 360nm and above. The experience and technology from this integration process was used for develop our closed frame systems.

Used in: 
FRONT-END

Key differences: 
Closed Frame Tool; Mask CD Metrology

Key Features: 
CD Measurement on Mask

Product Highlights

  • Fully automated metrology system
  • Closed tool architecture
  • Robot based and manual mask loading possible
  • Typical application: Mask Metrology for mask layers with feature size of 300nm and above
  • Critical dimension (CD) measurement
  • SECS/GEM interface - Fully remote host control
  • Combined reflected & transmitted light illumination modes
  • Mask sizes up to 9 inch

Your Contacts

Arne Holland
Head of Sales, Service and Applications