The Overlay software is an absolutely user friendly, advanced Overlay measurement algorithm for users with highest claims to
-  precision,
-  repeatability,
-  throughput,
-  low TIS,
-  automation.
It measures multi-layer boxes, frames, or bar type alignment marks.

The Nanostar Software is qualified to measure wafers with very low contrast appearing in manufacturing processes like STI (shallow trench isolation), and CMP (chemical mechanical polishing) using proprietary ACF filters. The ACF software filters provide contrast enhanced image pre-processing nearly without distortion of the original image to prevent false measurements.

MueTec 3000 MueTec 50 MueTec 100 MueTec 2000 MueTec <M5k> WI

CD Software
Defect Inspection Software
Inspection and Review Software
Defect Inspection and Review
SECS/GEM Software
Overlay Software