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Technical Papers Detailed  technical background information about our Products: European Mask and Lithography Conference, EMLC 2008 Frank Hillmann, Gerd Scheuring and Hans-Jürgen Brück: New Results from DUV Water Immersion Microscopy Using the CD Metrology System LWM500 WI with a High NA Condenser Download (340.83 KB) European Mask and Lithography Conference, EMLC 2007 Gerd Scheuring, Stefan Doebereiner, Frank Hillmann: New Approach for Defect Inspection on Large Area Masks Download () Press Release 2007 Hans-Juergen Brueck: MueTec installs Defect Review System "MueTec DefectCheck 5500" for Substrates up to 600 x 600 mm Download () Photomask Japan, PMJ 2007 Takeshi Yamane, Rikiya Taniguchi and Takashi Hirano: CD Metrology by an Immersion Microscope with High NA Condenser Lens for 45 nm Generation Masks Download () Photomask Japan, PMJ 2006 Takeshi Yamane, Rikiya Taniguchi and Takashi Hirano: Assurance of CD for 45nm Half-Pitch with Immersion Microscope Download () European Mask and Lithography Conference, EMLC 2006 Gian Luva Cassol, Giovanni Bianucci, Shiaki Murai, Guenther Falk, Gerd Scheuring, Stefan Doebereiner : A new life for a 10-year old MueTec2010 CD Measurement System Download () European Mask and Lithography Conference, EMLC 2004 Gerd Scheuring et al: DUV Water Immersion Technology Extends Linearity First Results from the new 65 nm Node CD Metrology System LWM500 WI Download () European Mask and Lithography Conference, EMLC 2003 Gerd Scheuring et al: Fully automated CD - Metrology and Mask Inspection in a Mask Production Environment using the MueTec M5k DUV Tool Download (1.3 MB) Get Brochures Please use our order form.