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MueTec 50 Semi-automatic metrology tool Mask Wafer MEMS CD Overlay FT I&R DI x = included. [x] = optional. CD = Critical Dimension (Linewidth Measurement), FT = Film Thickness, I&R = Inspection & Review, DI = Defect Inspection

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MueTec 50 is a semi-automatical Critical Dimension (CD) measurement system for masks, wafers, MEMS and others. MueTec 50 is using a ultra high quality Leica microscope with Laser Autofocus possibility. The system is equipped with the MueTec NanoStar software which permits easy and fast measurement setups, data statistics, and image enhancement, and includes a huge measurement package. The result is a powerful measuring equipment at a very reasonable price. This model is also optionally available with overlay registration and film thickness measurement software, UV illumination, and vibration isolation table. Specifications: Dynamic Precision: CD Measurements Masks Wafers ≤ 7nm 3σ ≤ 12nm 3σ Dynamic Precision: Film Thickness Measurements Oxide, Nitride Resist layers ≤ 1nm 3σ ≤ 3nm 3σ Dynamic Precision: Overlay Mesurements Etched wafers Resist on metal Tool induced shift ≤ 7nm 3σ ≤ 10nm 3σ ≤ 10nm 3σ Reliability, Availability, and Maintainability (RAM) Uptime MTBF MTBA MTTR ≥ 95% ≥ 1800h ≥ 160h ≤ 4h Clean room class 1 compatible Final specification will be agreed by customer and MueTec using mutually accepted samples.

Standard: CD Software Digital CCD Camera Image Autofocus Incident Light Illumination Options/Upgrades: Antivibration Base Frame Film Thickness Measurement Solutions Laser Autofocus System Overlay Software Rotable Camera Signal Tower SPC Software Transmitted Light Illumination UV@365nm Illumination