Mask

Wafer

MEMS

Customized Tools

Upgrades

OEM Products

Used Equipment

Downloads

Mask Overview All MueTec mask tools measure in a stepper like mode using VIS, UV-line or DUV-line illumination - and provide CATS™ compatibiliy.

MueTec 50 Semi-automatic measurement of masks, wafer and MEMS. Antivibration base frame is optionally available. MueTec 50 can be upgraded to MueTec 100. MueTec 100 Leica LWM 100 Fully automatic measurement of masks, wafer and MEMS. Antivibration base frame is optionally available. MueTec 100 can be upgraded to MueTec 2000. MueTec 2000 Fully automatic measurement of masks, wafers and MEMS. Antivibration base frame and rack for media controller and PCs included. System is designed for ultra high precision measurements. MueTec <M5k> WI Leica LWM 500WI Fully automatic measurement of masks using DUV-line illumination and Water immersion technique. System is designed for ultra high precision measurements for structures down to 0.1 micron.

Can’t find what you need? We can build you a customized tool, which exactly fits your needs. If you have problems finding what you need,  try browsing through our products by looking for the technology you need. Technology:Find out about our new Pattern Finder MueTec is cooperating successfully with Vistec Semiconductor Systems GmbH (formerly Leica Microsystems Semiconductor) in this field since 1995. Since 2001 MueTec also uses Leica DUV optics in a microscope platform, invented by MueTec and offering highest mechanical stability and Z-resolution for metrology.