Take Advantage of MueTec’s Experience
MueTec has a long-standing successful cooperation with semiconductor global main-players for wafer, masks and MEMS.


Mask
Wafer
MEMS
CD
Overlay
FT
I&R
DI
MueTec 100  Leica LWM 100
MueTec 3000  Leica LWS 3000
MueTec <M5k> WI  Leica LWM 500WI

x = included. [x] = optional.
CD = Critical Dimension (Linewidth Measurement),
FT = Film Thickness, I&R = Inspection & Review, DI = Defect Inspection

Our tools are designed and build based on your, the high-tech industry customer’s, individual demands. The complete hardware and software design, manufacturing, and service is done by MueTec
– all in one hand !





MueTec is cooperating successfully with Vistec Semiconductor Systems GmbH (formerly Leica Microsystems Semiconductor) in this field since 1995. Since 2001 MueTec also uses Leica DUV optics in a microscope platform, invented by MueTec and offering highest mechanical stability and Z-resolution for metrology.

Copyright © 2010 MueTec GmbH. All rights reserved.